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Aluminum-induced plasma membrane surface potential and H+-ATPase activity in near-isogenic wheat lines differing in tolerance to aluminum

Author:
Ahn, S.J., Rengel, Z., Matsumoto, H.
Source:
New phytologist 2004 v.162 no.1 pp. 71-79
ISSN:
0028-646X
Subject:
Triticum aestivum, wheat, grain crops, isogenic lines, genotype, genetic variation, metal tolerance, root tips, root growth, plasma membrane, membrane potential, H-transporting ATPase, enzyme activity, enzyme inhibition, nutrient solutions, aluminum, plant stress
Agid:
1523429