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Fabrication and characterization of stable ultrathin film micropatterns containing DNA and photosensitive polymer diazoresin

Author:
Yu, Bing, Cong, Hai-Lin, Liu, Hu-Wei, Lu, Cong-Hua, Wei, Fang, Cao, Wei-Xiao
Source:
Analytical and bioanalytical chemistry 2006 v.384 no.2 pp. 385-390
ISSN:
1618-2642
Subject:
DNA, X-ray photoelectron spectroscopy, atomic force microscopy, fluorescence emission spectroscopy, fluorescence microscopy, photosensitivity, polymers, scanning electron microscopy
Abstract:
Stable, ultrathin DNA micropatterns were fabricated from photosensitive polymer diazoresin (DR) through a self-assembly technique. The micropatterns were achieved on LBL ultrathin film after UV exposure through a photomask. The patterns were characterized systematically with scanning electron microscopy, atomic force microscopy, X-ray photoelectron spectroscopy and fluorescence microscopy. All of the results indicate that the combined LBL self-assembly and photolithography technique is a promising method for constructing stable, well-defined micropatterns with a nanoscale thickness.
Agid:
2819200