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Synthesis of hyperbranched polyacetals via an + b2‐type polyaddition (n = 3, 8, 18, and 21): Candidate resists for extreme ultraviolet lithography

Author:
Kudo, Hiroto, Matsubara, Shuhei, Yamamoto, Hiroki, Kozawa, Takahiro
Source:
Journal of polymer science 2015 v.53 no.20 pp. 2343-2350
ISSN:
0887-624X
Subject:
alpha-cyclodextrin, beta-cyclodextrin, polymers, solubility, thermal stability
Abstract:
Polyaddition (Aₙ + B₂) reactions of 1,1,1‐tris(4‐hydoxyphenyl) ethane (THPE; A₃‐type monomer), calix[4]resorcinarene (CRA[4]; A₈‐type monomer), α‐cyclodextrin (α‐CD; A₁₈‐type monomer), and β‐cyclodextrin (β‐CD; A₂₁‐type monomer) with 1,4‐bis(4‐vinyloxy)cyclohexane (BVOC; B₂‐type monomer) afforded corresponding soluble hyperbranched polyacetals. The physical properties, including solubility, thermal stability, and film‐forming ability, the ultraviolet‐induced degradation reactivity, and the solubility‐switch in an extreme ultraviolet (EUV) exposure tool indicated that poly(THPE‐co‐BVOC) and poly(CRA[4]‐co‐BVOC) are candidate next‐generation photo‐resists. © 2015 Wiley Periodicals, Inc. J. Polym. Sci., Part A: Polym. Chem. 2015, 53, 2343–2350
Agid:
4084861