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Studies on the corrosion behavior of yttrium-implanted zircaloy-4

Xu, Jian, Bai, Xinde, Fan, Yudian, Liu, Wenliang, Bei, Hongbin
Journal of materials science 2000 v.35 no.24 pp. 6225-6229
X-radiation, X-ray photoelectron spectroscopy, corrosion, energy, ions, sulfuric acid, transmission electron microscopy, yttrium, zirconium
In order to study the effects of yttrium ion implantation on the aqueous corrosion behavior of zircaloy-4, specimens were implanted with yttrium ions using a MEVVA source at an energy of 40 keV, with a dose range from 1 × 10¹⁶ to 1 × 10¹⁷ ions/cm² at about 150°C. Transmission electron microscopy (TEM) was used to obtain the structural character of the yttrium-implanted zircaloy-4. The valence of the yttrium ions in the surface layer was analyzed by X-ray photoemission spectroscopy (XPS). Three-sweep potentiodynamic polarization measurement was employed to evaluate the aqueous corrosion behavior of zircaloy-4 in a 1 N H₂SO₄ solution. It was found that a significant improvement was achieved in the aqueous corrosion resistance of zircaloy-4 compared with that of the as-received zircaloy-4. The mechanism of the corrosion resistance improvement of the yttrium-implanted zircaloy-4 is probably due to the addition of the yttrium oxide dispersoid into the zirconium matrix.