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Studies on the corrosion behavior of lanthanum-implanted zircaloy

Qian, Wan, Xinde, Bai, Xiaoyang, Liu, Xiao, Zhao
Journal of materials science 2005 v.40 no.2 pp. 475-479
X-radiation, X-ray diffraction, X-ray photoelectron spectroscopy, corrosion, energy, ions, lanthanum, sulfuric acid
In order to study the effects of the lanthanum ion implantation on the aqueous corrosion behavior of zircaloy, specimens were implanted with lanthanum ions using a MEVVA source at an energy of 40 keV, with a dose range from 5 × 10¹⁶ to 2 × 10¹⁷ ions/cm² at about 150°C. The surface structure was investigated by X-ray Diffraction (XRD) and the valence of the lanthanum ions in the surface layer was analyzed by X-ray Photoemission Spectroscopy (XPS). Three-sweep potentiodynamic polarization measurement was employed to evaluate the aqueous corrosion behavior of zircaloy in a 0.5 M H₂SO₄ solution. It was found that a significant improvement was achieved in the aqueous corrosion resistance of zircaloy compared with that of the as-received zircaloy. The mechanism of the corrosion resistance improvement of the lanthanum-implanted zircaloy is probably due to the addition of the lanthanum oxide dispersoid into the zircaloy matrix.