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Studies on the corrosion behavior of lanthanum-implanted zircaloy

Author:
Qian, Wan, Xinde, Bai, Xiaoyang, Liu, Xiao, Zhao
Source:
Journal of materials science 2005 v.40 no.2 pp. 475-479
ISSN:
0022-2461
Subject:
X-radiation, X-ray diffraction, X-ray photoelectron spectroscopy, corrosion, energy, ions, lanthanum, sulfuric acid
Abstract:
In order to study the effects of the lanthanum ion implantation on the aqueous corrosion behavior of zircaloy, specimens were implanted with lanthanum ions using a MEVVA source at an energy of 40 keV, with a dose range from 5 × 10¹⁶ to 2 × 10¹⁷ ions/cm² at about 150°C. The surface structure was investigated by X-ray Diffraction (XRD) and the valence of the lanthanum ions in the surface layer was analyzed by X-ray Photoemission Spectroscopy (XPS). Three-sweep potentiodynamic polarization measurement was employed to evaluate the aqueous corrosion behavior of zircaloy in a 0.5 M H₂SO₄ solution. It was found that a significant improvement was achieved in the aqueous corrosion resistance of zircaloy compared with that of the as-received zircaloy. The mechanism of the corrosion resistance improvement of the lanthanum-implanted zircaloy is probably due to the addition of the lanthanum oxide dispersoid into the zircaloy matrix.
Agid:
4397411