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Growth of Vanadium and Vanadium Oxide on a Rh(110) Surface

Author:
von Boehn, Bernhard, Menteş, Tevfik O., Locatelli, Andrea, Sala, Alessandro, Imbihl, Ronald
Source:
The Journal of Physical Chemistry C 2017 v.121 no.36 pp. 19774-19785
ISSN:
1932-7455
Subject:
X-ray photoelectron spectroscopy, electron microscopy, physical chemistry, temperature, vanadium
Abstract:
We have studied the epitaxial growth of thin layers of vanadium and vanadium oxide on a Rh(110) surface with low-energy electron diffraction (LEED), low-energy electron microscopy (LEEM), Auger electron spectroscopy (AES), and X-ray photoelectron spectroscopy (XPS). Up to six monolayers of V/VOₓ were deposited with temperatures varying between 370 and 770 K. For V deposition, (1 × n) and (n × 1) overlayers with n = 2 and 4 are observed. For the deposition of 3 MLE of VOₓ, a (12 × 1) structure is obtained as a stable structure. XPS of V 2p₃/₂ reveals the simultaneous presence of an oxidic and a metallic or strongly reduced (V²⁺) V component.
Agid:
5802548