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In-site synthesis molecular imprinting Nb2O5 –based photoelectrochemical sensor for bisphenol A detection

Author:
Gao, Pan, Wang, Hai, Li, Pengwei, Gao, Wenkai, Zhang, Yu, Chen, Junli, Jia, Nengqin
Source:
Biosensors & bioelectronics 2018 v.121 pp. 104-110
ISSN:
0956-5663
Subject:
Fourier transform infrared spectroscopy, X-ray diffraction, X-ray photoelectron spectroscopy, biosensors, bisphenol A, detection limit, electric current, irradiation, microstructure, molecular imprinting, scanning electron microscopy, transmission electron microscopy, ultraviolet radiation, ultraviolet-visible spectroscopy
Abstract:
In this work, a photoelectrochemical (PEC) sensor based on inorganic surface molecular imprinting Nb2O5 (MI-Nb2O5) for detection of bisphenol A (BPA) had been developed. In the PEC sensor, MI-Nb2O5 material was synthesized based on an in-situ surface molecular imprinting technique. The microstructure characteristics of the as-prepared photoactive materials were systematically investigated by XRD, SEM, TEM, XPS, FTIR and UV–vis spectroscopy. The PEC detection results showed that the MI-Nb2O5 material had higher photocurrent responses and excellent selectivity for contaminant BPA under UV-light irradiation owing to the abundant special recognition sites on the surface of MI-Nb2O5. Besides, the PEC sensor exhibited a wide detection range from 0.01 nmol·L⁻¹ to 30 nmol·L⁻¹ with a low limit of detection (LOD) of 0.004 nmol·L⁻¹. The interferences test showed that the sensor had a good selectivity to BPA molecules in the different interference solutions. This method combining molecular imprinting technique with photoelectrochemical detection measurement made a successful attempt to detect BPA and supplied a promising way to detect other environment pollutions rapidly and selectively in the future.
Agid:
6135534