Main content area

Photopolymerization of Coumarin-Containing Reversible Photoresponsive Materials Based on Wavelength Selectivity

Chen, Qiang, Yang, Qian, Gao, Pei, Chi, Baihong, Nie, Jun, He, Yong
Industrial & engineering chemistry process design and development 2019 v.58 no.8 pp. 2970-2975
coumarin, dimerization, irradiation, polymerization, polymers, process design, ultraviolet radiation, wavelengths
The photoresponse of the coumarin derivative based on reversible photodimerization and photocleavage has been studied for a long time. This paper reports a novel approach of preparing photoresponsive polymer materials containing coumarin structure by photopolymerization based on the wavelength selectivity. A photopolymerizable and photoresponsive monomer, 7-(hydroxyethoxy)-4-methyl-coumarin (AECM), was synthesized, and photopolymerization was performed on it using UV light irradiation (λ = 405 nm). After polymerization the polymer with coumarin pendant groups can achieve reversible photo-induced [2 + 2] dimerization under UV light (λ > 300 nm) and photocleavage of the cross-link to recovery back to the original structure through further irradiation with UV light (λ = 254 nm). What’s more, this monomer could be used to produce a high-resolution pattern and photo-responsive pressure sensitive adhesive through photopolymerization. The demonstrated approach opens new perspectives for the design of photoresponse materials.