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Facile chemical solution deposition of nanocrystalline CrN thin films with low magnetoresistance

Author:
Hui, Zhenzhen, Tang, Xianwu, Wei, Renhuai, Hu, Ling, Yang, Jie, Luo, Hongmei, Dai, Jianming, Song, Wenhai, Liu, Xingzhao, Zhu, Xuebin, Sun, Yuping
Source:
RSC advances 2014 v.4 no.24 pp. 12568-12571
ISSN:
2046-2069
Subject:
X-ray photoelectron spectroscopy, films (materials), nanocrystals, stoichiometry, temperature
Abstract:
CrN thin films are first prepared by a facile chemical solution deposition method. The results show that the derived CrN thin films are nanocrystalline with the grain size of 30–60 nm. X-ray photoelectron spectroscopy measurement shows the stoichiometry of the derived thin film. The temperature dependent resistivity within the range of 2–300 K shows a semiconductor-like behavior with dρ/dT < 0 and a discontinuity in resistivity at 253 K is observed due to the antiferromagnetic transition. At 10 K the magnetoresistance is as low as −0.06% under 45 kOe. The first growth of CrN thin films by the facile chemical solution deposition will provide an alternative route to prepare CrN thin films, especially for large-area CrN thin films with low-cost.
Agid:
6648836