PubAg

Main content area

MLA

Teng, Kai-Wen, et al. "Abnormal Redeposition of Silicate From Si3n4 Etching Onto Sio2 Surfaces In Flash Memory Manufacturing." Journal of materials science, v. 55,.3 pp. 1126-1135. doi: 10.1007/s10853-019-04119-x

APA

Teng, K., Tu, S., Hu, S., Huang, Y., Sheng, Y., & Tsao, H. (2020). Abnormal redeposition of silicate from Si3N4 etching onto SiO2 surfaces in flash memory manufacturing. Journal of materials science, 55, 1126-1135. doi: 10.1007/s10853-019-04119-x

Chicago

Teng, Kai-Wen, Sheng-Hung Tu, Ssu-Wei Hu, You-Xin Huang, Yu-Jane Sheng, and Heng-Kwong Tsao. "Abnormal redeposition of silicate from Si3N4 etching onto SiO2 surfaces in flash memory manufacturing" Journal of materials science 55, no. 3 (2020): 1126-1135. doi: 10.1007/s10853-019-04119-x